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JSPS SYMPOSIUM
Exchange between industry and science
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More than 800 attendees visited this year´s JSPS. |
The Summer Symposium 2009, held by The Japanese Society for Process Chemistry (JSPS) at Hunabori, was a successful event considering the intensive exchange between universities and public research institutes and the pharmaceutical industry. BASF Japan ran a booth at this annual symposium and presented its expertise regarding innovations, know-how and solutions in process chemistry, especially focused on ChiPros®, BASF´s series of chiral products, and on boron compounds as reagents for coupling reactions.
High numbers of visitors – researchers and process chemists who work in the industrial field – and numerous technical discussions with guests at the BASF booth reflect the success of this year’s symposium. About 800 attendees visited the event.
Most of the lectures and posters were focused on drug synthesis as well as catalytic and chiral methods for process development. Some of the highlights involved chiral amines as organo-catalysts for asymmetric aldol reactions as well as chiral hydride reagents.
For BASF and its customers, this is a helpful platform to discuss current topics directly and bring forward the solution or suggestions for customer needs at an early stage.
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